dc bias plasma

Glow Discharge dot Com - Comparison DC / RF 最後一張簡直太像了!!!XDDD    Characteristic Result Ionization a + g in RF, g only in DC Electron impact ionization more efficient in RF than DC Plasma potential lower in RF than DC Ion density drops more slowly away from the sample in RF than DC Plasma cell more filled with argon ion...

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(pulsed) DC plasma power supplies for sputtering, bias, PVD, etching, cleaning, nitriding 到底在想什麼 這個面試官...Fergutec offers a wide product range (pulsed) DC plasma power supplies for vacuum sputter, bias-sputtering, plasma nitriding, plasma etching and cleaning, electro plating and surface activation, ion sources, electro magnets and neutralizers....

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Zpulser Plasma Generator - Revolutionizing the Way Thin Films Are Engineered   當你失去希望, 要記住你曾經是那個最快的精子!!!Technology Pulsed DC plasma generators for magnetron discharge were first introduced in the late 1990s to reduce arcs during the deposition process, thus improving the ... Featured Product Zpulser Cyprium Introducing the Zpulser “Cyprium ”, our new second...

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Capacitively coupled plasma - Wikipedia, the free encyclopedia 也太大風了吧!A capacitively coupled plasma (CCP) is one of the most common types of industrial plasma sources. It essentially consists of two metal electrodes separated by a small distance, placed in a reactor. The gas pressure in the reactor can be lower than atmosph...

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