low k pecvd

Technical Glossary | Applied Materials DEVELOPMENT  A number used to compare performance of gate dielectric materials by indicating how thick a silicon oxide film would need to be to produce the same effect as the dielectric material being used. A number used to compare performance of high-k dielectric MOS...

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化學氣相沉積   看看這些大哥,閒著沒事角色扮演啊!2 Thin Films for ICs Conductor ¾Al, Al-Si, Al-Si-Cu, Al-Cu ¾Ti, Co, W, WSi 2 ¾TiN, TaN Semiconductor ¾Crystalline Si, poly-Si, SiGe Dielectric ¾USG, BPSG, PSG, SOG ¾Si 3N 4, SiON ¾FSG, low k dielectric, high k dielectric, etc. Organic materials...

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Producer® Black Diamond® PECVD | Applied Materials 學學旁邊的吧,有義氣,沒頭腦,這樣不行啊!The Black Diamond II nano-porous low-k film is the industry standard for the 45/32nm copper/low-k interconnects, with a k-value of approximately 2.5. Its predecessor, Black Diamond (k~3.0), is the industry-standard for the 90/65nm nodes....

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Producer® DARC® PECVD | Applied Materials   原來,長頸鹿界也有胖子啊!Used in conjunction with Applied Materials' APF (Advanced Patterning Film) strippable CVD hardmask, the APF/DARC film stack delivers litho-enabling solutions improvement in etch selectivity, CD control, and line edge roughness. The Applied Producer DARC ....

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Plasma PECVD - Kolzer Vacuum Coating Equipment   求求你行行好,別再把衣服和假髮晾在一起了!Plasma refers to the forth condition of matter. Plasma is a partially or totally ionized gas, thus, that particular gas condition in which neutral molecules, positive ions and free electrons are all present at the same time. In this case, plasma means low...

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TEOS-O2 PECVD - enigmatic-consulting.com   為什麼,我的iPhone開了飛行模是從四樓丟下去還是碎了!Plasma-Enhanced CVD from TEOS and Oxygen Combining TEOS with ozone, in an attempt to preserve the excellent step coverage of TEOS/oxygen LPCVD at lower temperatures, was successful but as we noted, results in significant problems with film stress ......

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