low k pecvd

Technical Glossary | Applied Materials DEVELOPMENT 哈哈哈哈這招也太絕了吧!!!!!A number used to compare performance of gate dielectric materials by indicating how thick a silicon oxide film would need to be to produce the same effect as the dielectric material being used. A number used to compare performance of high-k dielectric MOS...

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化學氣相沉積 吃了包子,變成包子!2 Thin Films for ICs Conductor ¾Al, Al-Si, Al-Si-Cu, Al-Cu ¾Ti, Co, W, WSi 2 ¾TiN, TaN Semiconductor ¾Crystalline Si, poly-Si, SiGe Dielectric ¾USG, BPSG, PSG, SOG ¾Si 3N 4, SiON ¾FSG, low k dielectric, high k dielectric, etc. Organic materials...

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Producer® Black Diamond® PECVD | Applied Materials 來看看你的背包怎麼拿!The Black Diamond II nano-porous low-k film is the industry standard for the 45/32nm copper/low-k interconnects, with a k-value of approximately 2.5. Its predecessor, Black Diamond (k~3.0), is the industry-standard for the 90/65nm nodes....

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Producer® DARC® PECVD | Applied Materials 對於2011一堆狗屁倒灶的事!讓我們一起對它說聲!再見!Used in conjunction with Applied Materials' APF (Advanced Patterning Film) strippable CVD hardmask, the APF/DARC film stack delivers litho-enabling solutions improvement in etch selectivity, CD control, and line edge roughness. The Applied Producer DARC ....

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Plasma PECVD - Kolzer Vacuum Coating Equipment 這樣存...還不知道要存到何時.......Plasma refers to the forth condition of matter. Plasma is a partially or totally ionized gas, thus, that particular gas condition in which neutral molecules, positive ions and free electrons are all present at the same time. In this case, plasma means low...

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TEOS-O2 PECVD - enigmatic-consulting.com 大雄!我勾不到你了! 哆啦A夢!我長大了!Plasma-Enhanced CVD from TEOS and Oxygen Combining TEOS with ozone, in an attempt to preserve the excellent step coverage of TEOS/oxygen LPCVD at lower temperatures, was successful but as we noted, results in significant problems with film stress ......

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