Development of 32nm CMOS and Recent Trend for Beyond 32nm
2 Content Develop. of 32nm CMOS-Gate Stack Process * Cost effective process * High-k material and related process issues (WF) * Gate First vsGate Last (HK first & HK last) * Related issues (UT-SiO2,,, ) * Summary Beyond 32nm Trend-2011 Symp. on VLSI ......