Dry Etching at the UCSB Nanofabrication Facility
Chlorine Etcher 2– Parallel Plate GaAs/AlGaAs –Mesa SiCl4/BCl3 10/15sccm, 15 mTorr, 115W, 200nm/min, PR mask B. Thibeault GaN Microdisk Laser A. Tamboli GaN Photonic Crystal K. McGroddy GaN/AlGaN Etch Cl2 10sccm, 5 mTorr, 200W, 110nm/min,...